This document gives guidance and requirements on the optimization of sputter-depth profiling parameters using appropriate single-layered and multilayered reference materials, in order to achieve optimum depth resolution as a function of instrument settings in Auger electron spectroscopy, X-ray photoelectron spectroscopy and secondary ion mass spectrometry.
This document is not intended to cover the use of special multilayered systems such as delta doped layers.
Status: PublishedPublication date: 2022-11
Edition: 3Number of pages: 17
Technical Committee: ISO/TC 201/SC 4 Depth profiling
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