ISO 21859:2019
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ISO 21859:2019
71990

Abstract  Preview

This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.


General information 

  •  :  Published
     : 2019-06
  •  : 1
     : 4
  •  : ISO/TC 206 Fine ceramics
  •  :
    81.060.30 Advanced ceramics

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std 2 38 Paper
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